Liquid Photoresists
Liquid Photoresists

Liquid Photoresists

Liquid Photoresists Specification

  • Solubility
  • Miscible with specific organic solvents
  • Storage
  • Keep in a cool dry and dark place
  • Ph Level
  • Neutral to Slightly Alkaline
  • Density
  • 1.2 Gram per cubic centimeter(g/cm3)
  • Form
  • Liquid
  • Structural Formula
  • Proprietary
  • HS Code
  • 370790
  • Smell
  • Solvent-like odor
  • Refractive Rate
  • 1.52 - 1.60
  • Molecular Weight
  • Variable
  • Purity
  • 99% or Customized Grades
  • Other Names
  • Photoresist Lithographic Resist
  • Shape
  • Liquid
  • Molecular Formula
  • Proprietary Formula
  • Poisonous
  • No
  • Classification
  • Industrial Chemical
  • Chemical Name
  • Liquid Photoresists
  • CAS No
  • Not Available
  • EINECS No
  • Not Available
  • Grade
  • High Purity
  • Standard
  • Industry Standard
  • Type
  • Photochemical Material
  • Usage
  • Used in photolithography processes for electronics and microfabrication
  • Main Material
  • Polymer and Photoactive Compounds
  • Application
  • Semiconductor manufacturing printed circuit boards and microelectromechanical systems
 
 

About Liquid Photoresists

Liquid Photoresists:

The offered liquid photoressits are classified as specialty chemicals that are required for producing PCB (printed circuit board) and as essential parts of image transferring technique. Exceptional brightness level, exceptional leaf plate condition, unique surface hardness level and high reactivity are some of the key attributes of these photoresists. These are perfect for highlighting ultra fine line. These liquid photoresists improve color contrast that the circuit line becomes clearly perceptible. We are engaged in producing film coating substances that are required for roller machine. We also provide photoressits for different liquid films to suit individual coating demands.
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